Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR500)
Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR500)
Designed with large chamber size made of quartz considered almost completely resistant against most plasma processes
RF Power: Max. 500W
Feature
Space-saving design with oscillation section integrated with a portion of the chamber
Feature
Equipped with a large quartz chamber (φ215mm) which can process bigger testing samples
Feature
Outstanding operability and safety by the automatic tuning system equipped as a standard function
Model | PR500 |
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System | DP mode, Barrel type |
High Frequency Output | Max. 500W |
Oscillation Frequency | 13.56MHz |
Tuning Method | Automatic tuning |
Reaction Chamber | Quartz φ215 × L305 mm x 1 chamber |
Reaction Gas System | Dual system (oxygen/CF4) |
Control System | Manual |
Piping Material | SUS, Teflon |
Accessories | Vacuum grease: 1 pc., O-ring for reaction chamber: 1 pc. |
Internal dimensions(φ×D mm) | φ215×305mm |
External dimensions(W×D×H mm) | 438×520×760mm |
Remarks(dimensions) | 215φ x 305Dmm x 1 chamber |
Power Source | AC115V/AC220V Single phase with step-down transformer |
Weight | 53kg |