Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR301)
Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR301)
Wide range of application such as ashing, etching, dry cleaning, etc.
RF Power: 300W
Feature
Space-saving due to the compact design
Feature
Adjustable RF power for various application
Feature
Flexible setting range of output to cope with a variety of testings
Model | PR301 |
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System | DP mode, Barrel type |
High Frequency Output | Max. 300W |
Oscillation Frequency | 13.56MHz |
Tuning Method | Manual biaxial |
Reaction Chamber | Pyrex Glass φ118 × L160mm x 1 chamber |
Reaction Gas System | 1 system (oxygen), flow meter |
Control System | Auto pressure regulation and Auto leakage valve |
Piping Material | SUS, Teflon |
Accessory | Vacuum grease x 1 pc, O-ring for reaction chamber x 1 pc |
Internal dimensions(φ×D mm) | φ118×160mm |
External dimensions(W×D×H mm) | 438×520×630mm |
Remarks(dimensions) | 118φ x 160Dmm x 1 chamber |
Power Source | AC115V/AC220V Single phase with step-down transformer |
Weight | 34kg |