Plasma Reactor (Barrel Chamber) (PR301)

Compact, Barrel Type, Low Temperature Ashing Device

Features of Plasma Reactor (Barrel Chamber) (PR301)

Category:

Description

Wide range of application such as ashing, etching, dry cleaning, etc.

RF Power: 300W

Feature

Space-saving due to the compact design

Feature

Adjustable RF power for various application

Feature

Flexible setting range of output to cope with a variety of testings

Model PR301
System DP mode, Barrel type
High Frequency Output Max. 300W
Oscillation Frequency 13.56MHz
Tuning Method Manual biaxial
Reaction Chamber Pyrex Glass φ118 × L160mm x 1 chamber
Reaction Gas System 1 system (oxygen), flow meter
Control System Auto pressure regulation and Auto leakage valve
Piping Material SUS, Teflon
Accessory Vacuum grease x 1 pc, O-ring for reaction chamber x 1 pc
Internal dimensions(φ×D mm) φ118×160mm
External dimensions(W×D×H mm) 438×520×630mm
Remarks(dimensions) 118φ x 160Dmm x 1 chamber
Power Source AC115V/AC220V
Single phase with step-down transformer
Weight 34kg

Title

Go to Top