Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR200)
Plasma Reactor (Barrel Chamber) (PR200)
Description
Wide range of application such as ashing, etching, dry cleaning, etc.
RF Power: 200W
Feature
Space-saving due to the compact design
Feature
Adjustable RF power for various application
Feature
Flexible setting range of output to cope with a variety of testings
| Model | PR200 |
|---|---|
| System | DP mode, Barrel type |
| High Frequency Output | Max. 200W |
| Oscillation Frequency | 13.56MHz |
| Tuning Method | Automatic |
| Reaction Chamber | Pyrex Glass φ100× L160mm |
| Reaction Gas System | 1 system (oxygen), flow meter |
| Control System | Manual leakage valve |
| Piping Material | SUS、Teflon |
| External Dimensions | W350 × D400× H500mm (without projection） |
| Accessory | Specimen stand x 1pc |
| Internal dimensions（φ×D mm） | φ100×160mm |
| External dimensions（W×D×H mm） | 350×400×500mm |
| Power Source | AC115V/AC220V Single phase with step-down transformer |
| Weight | 25kg |
